Three-Way Tubular High Vacuum Molecular Pump Unit Iso3666 Molecular Pump Rate 600l/S Ultimate Pressure ≤1.5×10⁻⁵Pa

Three-Way Tubular High Vacuum Molecular Pump Unit Iso3666 Molecular Pump Rate 600l/S Ultimate Pressure ≤1.5×10⁻⁵Pa

Product Introduction

As the core equipment for vacuum engineering and high temperature processing, VET-004 breaks through the traditional single-station limitation and adopts a three-way parallel design: each tube furnace has a diameter of φ120mm and can be independently temperature controlled (room temperature - 1200℃). It is equipped with a 600L/S molecular pump and a 9L/S rotary vane pump to achieve rapid establishment of vacuum from atmospheric pressure to 10⁻⁵Pa level within 30 minutes. The equipment supports real-time monitoring of multiple parameters such as vacuum degree, temperature, and gas flow, and has a built-in intelligent linkage system. When the vacuum degree is lower than the threshold, the protection mechanism is automatically activated to ensure the stability and repeatability of material reactions in high temperature environments. It is an ideal choice for university laboratories, corporate R&D centers, and precision manufacturing production lines.

Product Features

Three-way parallel processing: Independently control three-way tube furnaces, support simultaneous operation of processes with different temperatures and vacuum degrees, and increase efficiency by 300%.

Ultra-high vacuum performance: Molecular pump + rotary vane pump combined exhaust, ultimate pressure ≤1.5×10⁻⁵Pa, meeting the stringent vacuum requirements of thin film deposition, crystal growth, etc.

Precise temperature control: Each tube furnace is equipped with a PID intelligent temperature controller, with a temperature control accuracy of ±1℃, and supports free setting of the heating rate of 0-20℃/min.

Modular design: The molecular pump and rotary vane pump can be disassembled for maintenance, and the tube furnace tube supports quick replacement, reducing downtime and maintenance costs.

Safety protection system: high temperature overload alarm, vacuum leakage interlock shutdown, and furnace shell anti-scalding design to ensure operational safety.

Multi-gas source adaptation: 3-way air inlet interface is reserved (supporting argon, nitrogen, hydrogen, etc.), compatible with MFC mass flowmeter to accurately control gas flow.

International reference standard

ISO 3666:2015 "Vacuum Technology - Vacuum Gauge - Performance Parameters and Calibration Methods": The precision calibration of vacuum sensors meets international standards to ensure the reliability of pressure data.

ASTM E2149-13 "Test Method for Outgassing Rate of Materials under Dynamic Vacuum Conditions": Supports material outgassing rate detection function and meets the vacuum compatibility test requirements of aerospace materials.

IEC 61010-1:2010 "Safety Requirements for Electrical Equipment for Measurement, Control and Laboratory Use": The electrical system has passed the overload protection and ground fault detection certification and complies with laboratory safety regulations.

GB/T 16800-2012 "Vacuum Technology - Ultra-High Vacuum Flange": The pipeline interface adopts CF35 ultra-high vacuum flange, and the sealing performance reaches 10⁻⁹Pa・m³/s leakage rate level.

Product use

Material science research: carbon nanotube growth, graphene film deposition, metal alloy vacuum annealing

Semiconductor manufacturing: wafer-level vacuum drying, LED chip degassing before packaging

New energy field: lithium battery electrode material sintering, solid-state battery electrolyte vacuum synthesis

Analysis and testing: catalyst activity evaluation (gas adsorption/desorption test under vacuum environment)

Universities and research institutions: multi-station comparison experiment, high-temperature vacuum environment simulation teaching

Technical Parameters

Test objects and test items

Test objects

Tube furnace liner and sealing components

Semiconductor wafers, photovoltaic silicon wafers, ceramic substrates

Nano powder materials (such as graphene oxide, metal organic frameworks MOFs)

High temperature alloy samples, superconducting material specimens

Test items

Vacuum establishment time: time required to pump from atmospheric pressure to 10⁻³Pa/10⁻⁵Pa

Temperature uniformity: axial temperature distribution of tube furnace (within ±5℃ is qualified)

Material degassing rate: degassing volume per unit area of ​​specimen under high temperature vacuum environment

Seal reliability: leakage rate at CF flange connection (≤1×10⁻⁹Pa・m³/s)

Molecular pump efficiency: pumping rate stability test in different vacuum ranges (low/high vacuum section)